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Abstract The challenge of fabricating transparent and conductive (T/C) films and patterns for applications in flexible electronics, touch screens, solar cells, and smart windows remains largely unsolved. Traditional fabrication techniques are complex, costly, time‐consuming, and struggle to achieve the necessary precision and accuracy over electronic and optical properties. Here, hypersurface photolithography (HP), which integrates microfluidics, a digital micromirror device, and photochemical surface‐initiated polymerizations is used to create polymer brush patterns. The high‐throughput optimization enabled by HP provides conditions to fabricate patterns composed of cross‐linked polymer brushes containing Au‐binding 2‐vinylpyrrolidine (2VP) groups with precise control over the height and the composition at each pixel. Au nanoparticles (AuNPs) are incorporated into the polymer brush patterns through in situ reduction of Au ions, resulting in T/C composite AuNP/polymer brush patterns. The sheet resistance at 100 mA of a 2VP‐AuNP‐functionalized patterns on a glass substrate is 0.42 Ω sq⁻¹with 86% transmittance of visible light. Additional patterns demonstrate multiplexing by copatterning rhodamine B functionalized fluorescent polymer brushes and AuNP/polymer brush conductive domains. This work solves the challenge of creating T/C films by forming metal‐polymer composites from polymer brush patterns, offering a scalable solution for electronic and optical device development and fabrication.